Hyderabad, India - A newly established college in Hyderabad, the CVR College of Engineering, has named its microelectronics lab "The Professor Magdy Bayoumi Center for VLSI Design," after the Director of the UL Center for Advanced Computer Studies (CACS) & Department Head of Computer Science.
The Indian College is supported by several semiconductor companies, including Intel, SUN Microsystems, and Cadence. "VLSI" is the acronym for "Very Large-Scale Integration," technologies producing microchips which contain over 100,000 transistors.
Many CACS students come from the Hyderabad region, and several UL alumni have been major players in establishing a presence for American companies in India. In his recent visit to India, Dr. Bayoumi met with many of those alumni in Delhi and Bangalore, as well as Hyderabad. "It is very gratifying to see the global impact of CACS and UL," Bayoumi remarked.
Bayoumi was the Guest of Honor at a special celebration naming the Center. He met with students and faculty there, and give a lecture focusing on the opportunities at CACS and UL, and their growing role in globalization.
The CVR College was established to offer students a state-of-the art curriculum to respond to rapidly growing and advancing technologies. The College works very closely with the semiconductor industry to respond to work force needs.
Hyderabad is a city of 6.7 million, and the capital of the state of Andhra Pradesh in south India. "The City of Pearls," Hyderabad is one of the fastest growing centers in the world for Information Technology, ITES, and Biotechnology, particularly pharmaceuticals. The city hosts Microsoft's largest product development center outside of Redmond, as well other Fortune 500 Companies such as
Computer Associates, GE, IBM, Samsung, Deloitte, Oracle, Yahoo!, Dell, Qualcomm, ADP, Bank of America, Verizon, Convergys and numerous others.
Professor Bayoumi's visit to Hyderabad was coordinated by Dr. Raghava Cherabuddi, a CACS alumnus. Dr. Cherabuddi can be seen standing next to Dr. Bayoumi in the photograph, above.
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